Clarkson University's Pioneering Research in Chemical-Mechanical Planarization (CMP)

Strategic Insights -

Over the past two decades, Distinguished University Professor S.V. Babu has led the research and development of chemical-mechanical planarization (CMP) at Clarkson University's Center for Advanced Materials Processing (CAMP). CMP is a crucial enabling technology for the fabrication of complex logic and memory devices and other integrated circuit structures. Babu's team has made significant contributions to the field, addressing multiple problems and challenges in understanding and improving the CMP process.

Key Takeaways:

  • Clarkson University's CAMP has been a pioneer in CMP research and development for over two decades, with Distinguished University Professor S.V. Babu at the helm.
  • CMP is a critical technology for fabricating complex integrated circuits, and CAMP's research has addressed the multiple challenges and problems associated with this process.
  • The CAMP team has collaborated with various industry partners, including Intel, GlobalFoundries, and Micron, to develop and commercialize CMP technologies.
  • CAMP has received significant funding from Intel, including over $1.4 million in the past decade, and has also received royalties from Ferro Corporation for a CMP slurry formulation developed in Babu's laboratory.
  • The CMP symmetry has been an annual event since 1996, with Babu serving as the lead organizer for 19 consecutive years, and has attracted participants from around the world.
  • CAMP has supervised over 41 Ph.D. and 38 master's students, many of whom are now working in the field of CMP at leading companies such as Micron and GlobalFoundries.
  • Babu is currently editing a book on advanced CMP technologies and serving as a guest editor for the Electrochemical Society's Journal of Solid State Science and Technology.

Statistics:

  • Over $1.4 million in funding received from Intel in the past decade
  • 41 Ph.D. and 38 master's students supervised by CAMP
  • Over 100 researchers from around the world participated in the 2014 CMP Annual International Symposium
  • 19 consecutive years of CMP symposia led by S.V. Babu
  • 10-year research partnership between CAMP and Intel
  • Commercialization of CMP slurry formulation developed by CAMP and licensed by Ferro Corporation

Sources:

  • Clarkson University's Center for Advanced Materials Processing (CAMP)
  • Intel Corporation
  • Micron Technology
  • GlobalFoundries
  • Ferro Corporation
  • American Vacuum Society
  • Electrochemical Society
  • Woodhead Publishing
  • Wiley Interscience
  • Fudan University of China
  • Kyushu University and Kyushu Institute of Technology (Japan)
  • Shizuoka and Yamanashi University of Japan
  • National Taiwan University
  • Hanyang University of Korea
  • College of Nanoscale Science and Engineering