Plasma Processing Device and Retractable Sealing Part

Strategic Insights -

VerticalNews journalists report that a patent for a plasma processing device and retractable sealing part thereof has been published online by the United States Patent and Trademark Office (USPTO). The patent, filed by inventors Wang, Zhihao and Wu, Lei from Shanghai, China, was published on September 30, 2025. The patent's assignee is Advanced Micro-Fabrication Equipment Inc. China, from Shanghai, People's Republic of China.

The background of the invention highlights the limitations of using stainless steel bellows in plasma processing devices due to radio-frequency coupling, leading to unstable etching rates. The inventors aimed to provide a retractable sealing part that shields radio-frequency coupling while maintaining vacuum isolation and extension/retraction capabilities. The device comprises a bellows assembly, a sleeve assembly, and an insulating buffer layer, designed to ensure stable radio-frequency circuits and etching rates.

Key Takeaways:

  • The patent provides a plasma processing device with a retractable sealing part that shields radio-frequency coupling.
  • The retractable sealing part includes a bellows assembly, a sleeve assembly, and an insulating buffer layer.
  • The bellows assembly has a first end and a second end, and a sleeve assembly includes a first sleeve and a second sleeve.
  • Free ends of the first sleeve and the second sleeve are overlapped to form a radio-frequency shielding space.
  • The insulating buffer layer is arranged between the first sleeve and the second sleeve, ensuring they do not contact each other.
  • The patent includes 19 claims, outlining the design of the plasma processing device and retractable sealing part.
  • The device allows for adjustable relative positions of the upper and lower electrodes, enabling the distance between them to be adjusted.
  • The retractable sealing part is designed to maintain radio-frequency shielding space during extension and retraction of the bellows assembly.

Statistics:

  • The patent was filed on May 26, 2022.
  • The patent was published online on September 30, 2025.
  • The inventors are Wang, Zhihao and Wu, Lei from Shanghai, China.
  • The assignee of the patent is Advanced Micro-Fabrication Equipment Inc. China, from Shanghai, People's Republic of China.
  • The patent includes 19 claims.
  • The device allows for adjustable relative positions of the upper and lower electrodes.

Sources:

  • Wang, Zhihao, Plasma processing device and retractable sealing part thereof. U.S. Patent Number 12431337, filed May 26, 2022, and published online on September 30, 2025.
  • Patent URL (for desktop use only): https://ppubs.uspto.gov/pubwebapp/external.html?q=(12431337)&db=USPAT&type=ids