Researchers Explore Alternative Dry-Cleaning Process Gas with Lower Global Warming Potential
Researchers from Myongji University have detailed new data on chemicals and chemistry, focusing on an effort to find an alternative dry-cleaning process gas with low global warming potential (GWP). The study aimed to decrease greenhouse gas emissions by investigating the properties of carbonyl fluoride (COF2) as a potential replacement for the currently employed NF3 gas. Financial support for this research came from the Korea Evaluation Institute of Industrial Technology.
Key Takeaways:
- The study found that the dry-cleaning process conditions containing the power amount of the plasma source are related to the dissociation rate of the cleaning gas and dry-cleaning performance.
- The research investigated the effects of the amount of remote plasma power on the chamber cleaning rate with COF2 and its effects with diluted gases of O-2 and Ar.
- Numerical analysis and experiments revealed that the change in the amount of power induced different production rates of species in the gas mixture.
- In the case of O-2 dilution, oxygen radicals prevail in the plasma, producing a stable by-product of CO2 and more fluorine atoms and radicals.
- Oxygen radicals play a significant role in the dissociation of COF2, production of fluorine radicals, and help reduce the amount of cleaning inhibitors such as C-C and C-F compounds.
- The study concluded that additional dilution gases for cleaning gas affect production mechanisms and rates of species.
Statistics:
- The study was supported by the Korea Evaluation Institute of Industrial Technology.
- The research has been peer-reviewed.
- The findings were published in the IEEE Transactions on Semiconductor Manufacturing journal, volume 38, issue 3, pages 624-633.
- The research was conducted at Myongji University, Department of Semiconductor Engineering, Yongin 17058, South Korea.
Sources:
- Ieee Transactions On Semiconductor Manufacturing (2020) 38(3): 624-633
- Ieee-inst Electrical Electronics Engineers Inc, 445 Hoes Lane, Piscataway, NJ 08855-4141, USA
- Myongji University, Department of Semiconductor Engineering, Yongin 17058, South Korea
- Korea Evaluation Institute of Industrial Technology