Sintered Magnesium Oxide Material and Its Production Process

Strategic Insights -

The World Intellectual Property Organization has published Patent No. WO/2011/145265, titled "SINTERED MAGNESIUM OXIDE MATERIAL, AND PROCESS FOR PRODUCTION THEREOF," which describes a unique sintered magnesium oxide material with improved properties. The invention was filed on November 4, 2011, under Application No. PCT/JP2011/002133, by applicants Tateho Chemical Industries Co., Ltd. and Panasonic Corporation, in collaboration with inventors Tadasuke Kamei, Takuji Tsujita, Jun Hashimoto, Takayuki Shimamura, and Masashi Goto. The novel material is designed to prevent splashing during film formation and minimize clogging in film formation devices.

Key Takeaways:

  • The invention discloses a sintered magnesium oxide material with improved properties, comprising magnesium oxide, 3-50% of an oxide of an element from Group 2A (excluding magnesium), and optional additives (aluminum, yttrium, cerium, zirconium, scandium, or chromium) in concentrations not exceeding 1000 ppm.
  • The material is characterized by a disk-like, elliptical-plate-like, polygonal-plate-like, or half-moon-like shape or a cubic or rectangular solid shape with rounded apexes.
  • The disclosed material is intended for use as a deposition material in the production of a PDP-protecting film, which enables the prevention of splashing during film formation and minimizes clogging in film formation devices.

Statistics:

  • The patent was filed on November 4, 2011, under Application No. PCT/JP2011/002133.
  • The sintered magnesium oxide material comprises magnesium oxide (main component) and optional additives in concentrations not exceeding 1000 ppm.
  • The residence time for sintering the magnesium oxide material may range from 12 to 48 hours.

Sources:

  • World Intellectual Property Organization. Publication No. WO/2011/145265. Geneva: World Intellectual Property Organization, November 24. [WWW document]. Available from http://www.wipo.int.