Thermal Annealing Effect on Properties of Nickel Oxide Thin Films for Photovoltaic Applications

Investigations into the impact of thermal annealing on the structural, optical, and electrical properties of nickel oxide (NiO) thin films have led to significant findings in the field of photovoltaics. Researchers at the Indian Institute of Information Technology have employed a sol-gel spin coating technique to deposit NiO thin films on glass substrates, subjecting them to annealing temperatures ranging from room temperature to 400 degrees Celsius. The study aimed to explore the effects of thermal annealing on the material's properties, with a focus on its potential application in solar cells.

Key Takeaways:

• The crystallinity of NiO thin films improves with increasing annealing temperature, with a maximum value observed for a 300-degree Celsius annealed film.
• The average size of crystallites varies from 28 to 34 nm, with the largest size observed for the 300-degree Celsius annealed film.
• The SEM micrographs confirm the nano form of NiO nanoparticles, with particles ranging from 73 to 100 nm in size.
• The thin films exhibit semitransparent properties, with transmittance values ranging from 55% to 88% in the visible region.
• The film annealed at 300 degrees Celsius shows the highest conductivity, with a non-linear I-V curve behavior observed for all annealing temperatures.

Statistics:

• Annealing temperature range: 25 to 400 degrees Celsius
• Crystallite size range: 28 to 34 nm
• Particle size range: 73 to 100 nm
• Transmittance values: 55% (average) to 88% (visible region)
• Conductivity increase: observed with increasing annealing temperature

Sources:

• Thermal Annealing Effect On Properties of Nickel Oxide (Nio) Thin Films for Photovoltaic Applications. physica status solidi (a), 2025; 222(16).
• physica status solidi (a) can be contacted at: Wiley-v C H Verlag Gmbh, Postfach 101161, 69451 Weinheim, Germany.
• NewsRx. New Findings from Indian Institute of Information Technology in the Area of Electronics Reported [Thermal Annealing Effect On Properties of Nickel Oxide (Nio) Thin Films for Photovoltaic Applications]. Journal of Technology & Science. November 2, 2025; p 1924.