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Integrated circuit fabrication

Breakthrough in Semiconductor Etching: New Method for Etching Barium Titanate and Bi-Metal Oxides

Strategic Insights

— 1 min read

Researchers at Albany, NY, have developed a novel etching method for barium titanate and bi-metal oxides, crucial materials in advanced memory device design and fabrication. According to a patent application filed on March 28, 2024, and made available online on October 2, 2025, the new method uses carbon-based ligand gases to etch barium-containing layers, offering a more efficient and environmentally friendly alternative to traditional halogen-based methods.

Key Takeaways:

  • The new etching method involves patterning the barium-containing layer with a carbon-based ligand gas, followed by removing the resulting barium-containing product.
  • This process can be performed cyclically, with each cycle comprising exposing the barium-containing layer to a carbon-based ligand gas and removing the resulting product.
  • The method can also be used to etch bi-metal oxide layers, containing alkaline earth metals and transition metals.
  • The use of carbon-based ligand gases can potentially reduce environmental concerns associated with traditional etching methods.
  • The new method can lead to more efficient and high-volume manufacturing of ferroelectric devices.

Statistics:

  • The filing date for the patent application was March 28, 2024.
  • The patent application was made available online on October 2, 2025.
  • The method uses a variety of carbon-based ligand gases, including hexafluoro acetylacetonate (hfacac), amines, diamines, ethers, and their combinations.
  • The method can be used to etch barium-containing layers and bi-metal oxide layers, with the potential to reduce environmental concerns and improve manufacturing efficiency.

Sources:

  • Baillargeon, Joshua; Hajibabaeinajafabadi, Hamed; Lutker-Lee, Katie; Metz, Andrew. Etching Bi-Metal Oxides With Alkaline Earth Metals. U.S. Patent Application Number 20250305149, filed March 28, 2024 and posted October 2, 2025.
  • https://ppubs.uspto.gov/pubwebapp/external.html?q=(20250305149)&db=US-PGPUB&type=ids

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