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Plasma Etching Research Yields Breakthrough in Anti-Reflective Surface Structures

Strategic Insights

— 1 min read

Researchers at the Beijing University of Technology have made a significant discovery in the field of plasma etching, developing a novel anti-reflective surface structure that enhances light absorption efficiency in silicon-based optoelectronic devices. The study, funded by the Beijing Natural Science Foundation-huairou Innovation Joint Fund Project, employed an inductively coupled plasma etching system to create micro-nano composite structures with enhanced anti-reflective properties. The research team, led by Zhiwei Fan, found that by optimizing etching conditions, they could achieve an average reflectivity of as low as 1.86%.

Key Takeaways:

  • Researchers at the Beijing University of Technology have developed a novel anti-reflective surface structure using plasma etching, enhancing light absorption efficiency in silicon-based optoelectronic devices.
  • The study employed an inductively coupled plasma etching system to create micro-nano composite structures with optimized etching conditions, achieving an average reflectivity of 1.86%.
  • The research was funded by the Beijing Natural Science Foundation-huairou Innovation Joint Fund Project.
  • The team, led by Zhiwei Fan, included Liang Xu, Biyun Zhou, Tao Chen as co-authors.
  • The study focused on the micro-nano fabrication process, investigating the effects of gas flow rate ratio, ICP power, RF power, and etching time on the surface morphology and reflectance of the composite structures.

Statistics:

  • The average reflectivity of the prepared surface structure was as low as 1.86%.
  • The study employed an inductively coupled plasma (ICP) etching system.
  • The research team optimized etching conditions, achieving the following results:

+ SF [6] flow rate: 18 sccm

+ O [2] flow rate: 9 sccm

+ C [4] F [8] flow rate: 4 sccm

+ ICP power: 300 W

+ RF power: 5 W

+ Etching time: 5 min

  • The research was published in the journal Micromachines, a free version of the article is available at https://doi-org.sdpl.idm.oclc.org/10.3390/mi16050503.

Sources:

  • NewsRx. "Beijing University of Technology Researchers Target Plasma Etching (Fabrication of Anti-Reflective Composite Structures on Inverted Pyramids Using Inductively Coupled Plasma Etching)". Nanotechnology Weekly. June 9, 2025; p 40.
  • Fabrication of Anti-Reflective Composite Structures on Inverted Pyramids Using Inductively Coupled Plasma Etching. Micromachines, 2025,16(5):503. (Micromachines - http://www.mdpi.com/journal/micromachines/).

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