Thin Film Semiconductor Device Production Process for Displaying Purposes: A Patent Analysis

The World Intellectual Property Organization (WIPO) has published a patent titled "PROCESS FOR PRODUCTION OF THIN FILM SEMICONDUCTOR DEVICE FOR DISPLAYING PURPOSES" with the application number PCT/JP2010/003404 on May 20, 2010. The patent, filed by Panasonic Corporation, describes a process for producing a thin film semiconductor device for displaying purposes, comprising multiple steps including providing a glass substrate, forming an undercoat layer, and carrying out an annealing treatment to crystallize an amorphous semiconductor layer.

Key Takeaways:

  • The patented process involves eight steps, including providing a glass substrate, forming an undercoat layer, and forming a source and drain electrodes.
  • The process includes a reduction reaction treatment of the interface between the undercoat layer and the gate electrode, which is carried out at least once subsequent to the second step and prior to the seventh step.
  • The crystallization of the amorphous semiconductor layer is achieved through an annealing treatment at a temperature ranging from 700 to 900°C.
  • The patent was filed on May 20, 2010, and published on November 24, 2011, under World Intellectual Property Organization (WIPO) Publication No. WO/2011/145149.
  • The inventors of the patented process are Nishida, Kenichirou and Nagai, Hisao.
  • The patent describes a process for producing a thin film semiconductor device for displaying purposes, which is crucial for the development of flat-panel displays and other electronic devices.

Statistics:

  • The patent was published on November 24, 2011.
  • The patent was filed on May 20, 2010.
  • The application number is PCT/JP2010/003404.
  • The patent publication number is WO/2011/145149.
  • The temperature range for the annealing treatment is 700 to 900°C.

Sources:

  • World Intellectual Property Organization (WIPO) Publication No. WO/2011/145149
  • Panasonic Corporation, inventors: Nishida, Kenichirou and Nagai, Hisao
  • Application number: PCT/JP2010/003404
  • Publication date: November 24, 2011
  • Filing date: May 20, 2010